Tokyo, Japan

Seinoshin Hayami

This inventor holds 1 USPTO granted patent. Top assignee: Pacific Metals Co., Ltd.. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seinoshin Hayami. Retrieved from https://idiyas.com/inventor/seinoshin-hayami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Seinoshin Hayami: Innovator in Particle Removal Technology

Introduction

Seinoshin Hayami is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of particle removal technology. His innovative approach has led to the development of a unique method that addresses the challenges of removing particles smaller than 10 micrometers.

Latest Patents

Seinoshin Hayami holds a patent for a method of removing particles having a size less than 10 µm. This patent showcases his expertise and commitment to advancing technology in this specialized area. His work is crucial for various applications, particularly in industries that require high levels of cleanliness and precision.

Career Highlights

Hayami is currently associated with Pacific Metals Co., Ltd., where he continues to innovate and develop new technologies. His role at the company allows him to apply his knowledge and skills in practical settings, contributing to the advancement of the industry.

Collaborations

Throughout his career, Seinoshin Hayami has collaborated with talented individuals such as Qingquan Su and Hiroshi Sasaki. These partnerships have fostered a creative environment that encourages the exchange of ideas and enhances the development of innovative solutions.

Conclusion

Seinoshin Hayami is a distinguished inventor whose work in particle removal technology has made a significant impact. His patent and collaborations reflect his dedication to innovation and excellence in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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