Suwon, South Korea

Seil Choi

This inventor holds 1 USPTO granted patent and 6 published patent applications. Top assignee: Samsung Sdi Co., Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seil Choi. Retrieved from https://idiyas.com/inventor/seil-choi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Seil Choi: Innovator in Hardmask Composition

Introduction

Seil Choi is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of hardmask compositions used in pattern formation.

Latest Patents

Seil Choi holds a patent for a hardmask composition and a method of forming patterns. This innovative composition includes a polymer derived from a specific compound and a solvent. His work in this area is crucial for advancements in semiconductor manufacturing.

Career Highlights

Choi is currently employed at Samsung SDI Co., Inc., where he continues to push the boundaries of technology and innovation. His expertise in hardmask compositions has positioned him as a valuable asset in the industry.

Collaborations

Throughout his career, Seil Choi has collaborated with talented individuals such as Donghoon Won and Yongsik Yoo. These partnerships have fostered a creative environment that enhances the development of new technologies.

Conclusion

Seil Choi's contributions to the field of hardmask compositions exemplify his dedication to innovation and technology. His work not only advances the industry but also inspires future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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