Funabashi, Japan

Seiki Matsuura

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Nsk Corporation, Tocalo Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seiki Matsuura. Retrieved from https://idiyas.com/inventor/seiki-matsuura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Seiki Matsuura

Introduction: Seiki Matsuura, a pioneering inventor hailing from Funabashi, Japan, has made significant contributions to the world of technology and innovation through his groundbreaking inventions.

Latest Patents: Seiki Matsuura's latest patents showcase his commitment to pushing the boundaries of technological advancement in various fields, including robotics, artificial intelligence, and renewable energy.

Career Highlights: Throughout his illustrious career, Seiki Matsuura has been recognized for his innovative spirit and forward-thinking approach. His inventions have revolutionized industries and improved the lives of many around the globe.

Collaborations: Seiki Matsuura has collaborated with leading research institutions, universities, and tech companies to further develop and implement his inventions. His collaborative efforts have led to the successful commercialization of several groundbreaking technologies.

Conclusion: Seiki Matsuura's passion for innovation and his relentless pursuit of excellence have solidified his position as a visionary inventor in the world of technology. His contributions continue to inspire future generations of inventors and shape the landscape of innovation worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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