Aichi, Japan

Seiki Ito

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Chuo Hatsujo Kabushiki Kaisha. Active years: 2021.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Seiki Ito - Innovator in Flocking Powder Coated Articles

Introduction

Seiki Ito is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of material coatings, particularly through his innovative patent related to flocking powder coated articles. His work exemplifies the intersection of creativity and practicality in modern manufacturing.

Latest Patents

Seiki Ito holds a patent for a flocking powder coated article. This invention comprises a base material and a flocking coating layer. The flocking coating layer includes a coating film constituted by a powder coating, along with a portion of a flocking organic filler buried in the powder coating. Additionally, the flocking layer is constituted by another portion of the flocking organic filler projecting from the coating film. Notably, this flocking powder coated article does not have an adhesive layer for fixing the flocking organic filler.

Career Highlights

Seiki Ito is associated with Chuo Hatsujo Kabushiki Kaisha, where he has been able to apply his innovative ideas in a practical setting. His work has led to advancements in the field of coatings, showcasing his ability to blend technical knowledge with creative solutions.

Collaborations

Seiki Ito has collaborated with notable coworkers, including Takashi Yamashita and Hidekazu Ito. These partnerships have likely contributed to the development and refinement of his innovative ideas.

Conclusion

Seiki Ito's contributions to the field of flocking powder coated articles highlight his innovative spirit and technical expertise. His patent reflects a significant advancement in material coatings, demonstrating the potential for further developments in this area.

Profile summary based on public USPTO records.
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