Fukaya, Japan

Seiji Sagou


Average Co-Inventor Count = 2.1

ph-index = 3

Forward Citations = 40(Granted Patents)


Location History:

  • Saitama, JP (1990)
  • Fukaya, JP (1987 - 1993)

Company Filing History:


Years Active: 1987-1993

Loading Chart...
7 patents (USPTO):Explore Patents

Title: Seiji Sagou: Innovator in Aperture Pattern Printing Technology

Introduction

Seiji Sagou is a prominent inventor based in Fukaya, Japan. He has made significant contributions to the field of printing technology, particularly in the development of aperture pattern printing plates. With a total of 7 patents to his name, Sagou's work has advanced the manufacturing processes used in creating shadow masks.

Latest Patents

Among his latest patents is the "Aperture Pattern Printing Plate," which is designed for manufacturing a shadow mask. This innovative printing plate features an opaque layer that forms in parts on the surface of a transparent plate. The opaque layer corresponds to apertures in the effective area of the shadow mask, projecting from the transparent plate with a thickness ranging from 30 to 50 micrometers. Another notable patent is the "Method of Manufacturing an Aperture Pattern Printing Plate," which streamlines the production process using only one original printing plate. This method allows for the creation of both transparent and opaque portions on the printing plate, facilitating the efficient manufacturing of shadow masks.

Career Highlights

Seiji Sagou is currently employed at Kabushiki Kaisha Toshiba, where he continues to innovate and develop new technologies. His work has not only contributed to the advancement of printing technology but has also positioned him as a key figure in his field.

Collaborations

Throughout his career, Sagou has collaborated with notable coworkers, including Takeo Itou and Yasuhisa Ohtake. These collaborations have further enriched his work and contributed to the success of various projects.

Conclusion

Seiji Sagou's contributions to the field of printing technology, particularly through his patents and innovative methods, have made a lasting impact. His work continues to influence the manufacturing processes used in creating shadow masks, showcasing his importance as an inventor in this specialized area.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…