The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 1993
Filed:
Nov. 14, 1991
Applicant:
Inventors:
Yasuhisa Ohtake, Fukaya, JP;
Yasushi Magaki, Fukaya, JP;
Mitsuaki Yamazaki, Fukaya, JP;
Seiji Sagou, Fukaya, JP;
Hiroshi Tanaka, Fukaya, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430 23 ; 430-5 ; 430292 ; 430302 ; 430325 ;
Abstract
An aperture pattern printing plate for manufacturing a shadow mask having an opaque layer form in parts on a surface of a transparent plate. The parts of the opaque layer corresponding to apertures in an effective area of the shadow mask. The opaque layer projecting from the transparent plate, and having a thickness of 30 to 50 .mu.m.