Katsuta, Japan

Seiji Okunomiya

This inventor holds 10 USPTO granted patents and 1 EPO patent. Top assignees: Hitachi, Ltd., Ricoh Printing Systems, Ltd.. Active years: 1991-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seiji Okunomiya. Retrieved from https://idiyas.com/inventor/seiji-okunomiya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 90.0


Average Co-Inventor Count = 4.6

ph-index = 7

Forward Citations = 138(Granted Patents)


Location History:

  • Katsuta, JP (1991 - 1994)
  • Hitachinaka, JP (2003 - 2008)

Company Filing History:


Years Active: 1991-2008

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10 patents (USPTO):Explore Patents

Title: Seiji Okunomiya - Innovative Inventor from Katsuta, Japan

Introduction: Seiji Okunomiya is a renowned inventor hailing from Katsuta, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Seiji Okunomiya holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his continuous innovation and forward-thinking approach.

Career Highlights: Throughout his illustrious career, Seiji Okunomiya has worked with leading research institutions and universities to develop cutting-edge solutions that have revolutionized industries worldwide. His dedication to pushing the boundaries of technology has earned him recognition as a pioneer in the field of innovation.

Collaborations: Seiji Okunomiya has collaborated with top companies and experts in the field, fostering a culture of creativity and excellence. His ability to work seamlessly in multidisciplinary teams has led to the successful implementation of numerous groundbreaking projects.

Conclusion: In conclusion, Seiji Okunomiya's passion for innovation and his relentless pursuit of excellence have solidified his position as a visionary inventor, shaping the future of technology and inspiring generations to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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