Ibaraki, Japan

Seiji Nakasumi

This inventor holds 1 USPTO granted patent. Top assignee: Jx Metals Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seiji Nakasumi. Retrieved from https://idiyas.com/inventor/seiji-nakasumi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Seiji Nakasumi: Innovator in Tungsten Sputtering Technology

Introduction

Seiji Nakasumi is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of tungsten sputtering targets. His work is characterized by a commitment to high purity and advanced manufacturing techniques.

Latest Patents

Nakasumi holds a patent for a tungsten sputtering target and the method for manufacturing the same. This invention specifies that the tungsten sputtering target has a purity of 5 N (99.999% by weight) or more. Additionally, it ensures that the impurities of carbon and oxygen contained in tungsten are 50 ppm by weight or less, respectively. The average grain size of the tungsten crystal is more than 100 μm, which enhances the performance of the sputtering target in various applications.

Career Highlights

Seiji Nakasumi is currently associated with JX Metals Corporation, where he continues to innovate in the field of materials technology. His expertise in tungsten and its applications has positioned him as a key figure in the industry.

Collaborations

Nakasumi has worked alongside talented colleagues such as Shinji Sogawa and Takafumi Dasai. Their collaborative efforts contribute to the advancement of technology in their field.

Conclusion

Seiji Nakasumi's contributions to tungsten sputtering technology exemplify the importance of innovation in materials science. His patent reflects a significant advancement that can impact various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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