Niihama, Japan

Seiji Muro

This inventor holds 1 USPTO granted patent. Top assignee: Sumitomo Chemical Company, Limited. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seiji Muro. Retrieved from https://idiyas.com/inventor/seiji-muro

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Seiji Muro: Innovator in Projection Screen Technology

Introduction

Seiji Muro is a notable inventor based in Niihama, Japan. He has made significant contributions to the field of projection screen technology. His innovative approach focuses on enhancing image quality while maintaining light transmittance.

Latest Patents

Muro holds a patent for a projection screen that incorporates a plural number of light control layers. This invention is designed to provide high light diffusion and superior image quality over a wide angle range. The unique feature of his patent is that the haze value of each layer is dependent on the angle, allowing for optimal performance when light is injected at various angles.

Career Highlights

Seiji Muro is currently employed at Sumitomo Chemical Company, Limited. His work at this esteemed organization has allowed him to explore and develop advanced technologies in projection systems. Muro's dedication to innovation has positioned him as a key figure in his field.

Collaborations

Muro collaborates with Toyokazu Okada, a fellow innovator. Their partnership has fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Seiji Muro's contributions to projection screen technology exemplify the spirit of innovation. His patent reflects a commitment to improving image quality and light transmittance in projection systems. Muro's work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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