Company Filing History:
Years Active: 2021
Title: Seiji Murai: Innovator in Substrate Treatment Technology
Introduction
Seiji Murai is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate treatment technology, holding a total of 4 patents. His innovative work has advanced the efficiency and effectiveness of substrate processing methods.
Latest Patents
Murai's latest patents include a substrate treating apparatus and a substrate treating method. The substrate treating apparatus features an indexer division, stories, and a controller. Each story consists of a first rack, a treating section, and a main transport mechanism. The indexer division includes a carrier rack and a transport device, which performs feeding operations to transport substrates from a carrier on the carrier rack to the first rack. Additionally, the transport device facilitates inter-story transporting operations between first racks across different stories.
Another notable patent is the substrate treating apparatus and method for controlling the substrate treating apparatus. This invention includes a second substrate transportation mechanism designed to transport substrates from a substrate buffer unit to a FOUP placed on an opener. If specific conditions are met, this mechanism can also transport substrates from the FOUP back to the substrate buffer unit. This dual functionality enhances the efficiency of FOUP transportation, allowing for improved operational workflows.
Career Highlights
Seiji Murai is currently employed at Screen Holdings Co., Ltd., where he continues to develop innovative solutions in substrate treatment technology. His work has been instrumental in enhancing the capabilities of substrate processing systems.
Collaborations
Murai collaborates with notable colleagues, including Joji Kuwahara and Yukihiko Inagaki. Their combined expertise contributes to the advancement of technology in their field.
Conclusion
Seiji Murai's contributions to substrate treatment technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of substrate processing methods, demonstrating the importance of innovation in this field.
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