Otsu, Japan

Seiji Endoh

This inventor holds 1 USPTO granted patent. Top assignee: Toyo Boseki Kabushiki Kaisha. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seiji Endoh. Retrieved from https://idiyas.com/inventor/seiji-endoh-5n16v90r

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Seiji Endoh: Innovator in Polymeric Whiskers

Introduction

Seiji Endoh, an inventive mind hails from Ohtsu, Japan, and is recognized for his contribution to the field of polymers. With a commitment to innovation, he has successfully patented a unique creation that has significant industrial applications.

Latest Patents

Endoh holds a notable patent for a polymeric whisker and its production. This invention describes a crystalline polymeric whisker comprising repeating units derived from specific compounds, including p-oxybenzoyl and 2-oxy-6-naphthoyl. The whisker is distinguished by its high elasticity, tenacity, and excellent heat resistance, making it valuable for various applications in material science.

Career Highlights

Currently, Seiji Endoh is employed at Toyo Boseki Kabushiki Kaisha, where he continues to pursue advancements in polymer technology. His commitment to research and development has bolstered the company's reputation for innovation in the textile industry.

Collaborations

Throughout his career, Endoh has collaborated with esteemed colleagues such as Kunio Kimura and Toshihiko Ohta. These partnerships highlight the synergy and collective expertise that drive innovation in their projects.

Conclusion

With his pioneering work in polymeric whiskers, Seiji Endoh exemplifies the spirit of innovation. His contributions not only enhance the capabilities of materials but also inspire future advancements within the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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