Tokyo, Japan

Seiji Amamori

This inventor holds 1 USPTO granted patent. Top assignee: Nbc Meshtec Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seiji Amamori. Retrieved from https://idiyas.com/inventor/seiji-amamori

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Seiji Amamori: Innovator in Screen Printing Technology

Introduction

Seiji Amamori is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of screen printing technology. His innovative designs have enhanced the accuracy and efficiency of printing processes.

Latest Patents

Amamori holds a patent for a unique screen plate designed for screen printing. This screen plate features a plate frame, a supporting body screen, and a printing screen. The supporting body screen is constructed from an n/m twilled weave textile, which provides excellent printing accuracy. His patent is a testament to his commitment to advancing printing technology.

Career Highlights

Seiji Amamori is currently associated with Nbc Meshtec Inc., where he continues to develop innovative solutions in screen printing. His work has garnered attention for its practical applications and technical advancements. Amamori's dedication to his craft has established him as a respected figure in the industry.

Collaborations

Amamori has worked alongside talented colleagues, including Hiroki Sano and Nobukazu Motojima. Their collaborative efforts have contributed to the success of various projects within the company.

Conclusion

Seiji Amamori's contributions to screen printing technology exemplify his innovative spirit and dedication to excellence. His patent and ongoing work at Nbc Meshtec Inc. highlight his role as a key player in advancing the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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