Hamuramachi, Japan

Seiichirou Shirai


Average Co-Inventor Count = 16.5

ph-index = 6

Forward Citations = 88(Granted Patents)


Location History:

  • Hamura, JP (1993 - 1998)
  • Hamura-machi, JP (1996 - 2005)

Company Filing History:


Years Active: 1993-2005

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12 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Seiichirou Shirai

Introduction

Seiichirou Shirai is a distinguished inventor located in Hamuramachi, Japan. He holds a total of 12 patents, contributing significantly to the field of semiconductor technology. His inventions focus on the fabrication processes of semiconductor integrated circuit devices, demonstrating his expertise and innovative spirit.

Latest Patents

Among his latest patents, one notable invention is a semiconductor integrated circuit device and its associated fabrication process. This intricate process involves the formation of Metal-Insulator-Semiconductor Field-Effect Transistors (MISFETs) over the active regions of a substrate, which are bordered by inactive regions defined by an element separating insulating film and channel stopper regions. The process consists of several steps, including: the formation of a first mask using a non-oxidizable mask and an etching mask; the creation of a second mask on and in self-alignment with the side walls of the first mask; etching of the principal surface of the inactive regions; forming an element separating insulating film through oxidation; and the introduction of impurities to form channel stopper regions after the removal of both masks. This advanced methodology signifies a leap forward in semiconductor device fabrication.

Another significant patent involves a semiconductor integrated circuit device that features a first wiring strip exposed through a connecting hole, a transition-metal film within that hole, and an aluminum wiring strip situated above it, along with a transition-metal nitride film positioned between the aluminum strip and the transition-metal film. These contributions play a crucial role in the ongoing evolution of semiconductor technology.

Career Highlights

Seiichirou Shirai's professional journey includes working at prestigious companies such as Hitachi, Ltd. and Hitachi VLSI Engineering Corporation. His experiences at these leading firms have undoubtedly enriched his expertise, enabling him to make significant advancements in the semiconductor industry.

Collaborations

Throughout his career, Shirai has collaborated with esteemed colleagues such as Jun Sugiura and Osamu Tsuchiya. These collaborations have likely fostered a productive exchange of innovative ideas and encouraged further advancements in technology.

Conclusion

Seiichirou Shirai's contributions to semiconductor technology through his patents reflect his dedication to innovation. His work not only highlights the importance of collaboration in scientific advancement but also establishes him as a key player in the evolving landscape of semiconductor integrated circuits. The impact of his inventions will undoubtedly resonate in the industry for years to come.

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