The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1998
Filed:
Feb. 13, 1996
Hitachi, Ltd., Tokyo, JP;
Abstract
A technique to minimize an increase in the design and manufacture times required for making phase shift masks is provided. The process of the technique involves preparing a hole unit cell comprising one target hole and auxiliary holes located close to the four sides of the target hole, and then laying out on first layout data first hole unit cells 26c.sub.1 -26c.sub.3 arranged in a certain orientation at a first pitch and second hole unit cells 27c.sub.1 -27c.sub.3 arranged in the same orientation at a second pitch, narrower than the first pitch. This process generates data of hole groups, each comprising the target hole and auxiliary holes on a first phase shift mask that is used in forming hole patterns in a resist film coated over the semiconductor substrate.