Otsu, Japan

Seiichiro Yokohama

This inventor holds 1 USPTO granted patent. Top assignee: Toyo Boseki Kabushiki Kaisha. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seiichiro Yokohama. Retrieved from https://idiyas.com/inventor/seiichiro-yokohama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Seiichiro Yokohama: Innovator in Hydrogenated Amorphous Silicon Film

Introduction

Seiichiro Yokohama is a notable inventor based in Otsu, Japan. He has made significant contributions to the field of materials science, particularly in the production of hydrogenated amorphous silicon films. His innovative work has implications for various applications, including solar cells and electronic devices.

Latest Patents

Yokohama holds a patent for a "Process for producing hydrogenated amorphous silicon film." This process involves the production of a silicon compound that contains at least one element selected from hydrogen and halogens. The resulting film exhibits a photosensitivity of not less than 0.1 erg/cm² at 780 nm. This advancement is crucial for enhancing the efficiency of devices that utilize silicon-based materials.

Career Highlights

Throughout his career, Seiichiro Yokohama has been associated with Toyo Boseki Kabushiki Kaisha, where he has contributed to various research and development projects. His expertise in materials science has positioned him as a key figure in the advancement of silicon film technology.

Collaborations

Yokohama has collaborated with notable colleagues, including Osamu Imagawa and Masazumi Iwanishi. These partnerships have fostered innovation and have led to the successful development of new technologies in the field.

Conclusion

Seiichiro Yokohama's contributions to the field of hydrogenated amorphous silicon film demonstrate his commitment to innovation and excellence. His work continues to influence advancements in technology and materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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