Hsin-Chu, Taiwan

Seiichi Kure


Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Hsin-chu, TW (2023)
  • Kumamoto, JP (2023)

Company Filing History:


Years Active: 2023

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2 patents (USPTO):Explore Patents

Title: Seiichi Kure: Innovator in Substrate Processing Technology

Introduction

Seiichi Kure is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of substrate processing technology, holding a total of 2 patents. His work focuses on developing advanced apparatuses and methods that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

Seiichi Kure's latest patents include a substrate processing apparatus and a developing treatment apparatus. The substrate processing apparatus features a nozzle for discharging a processing solution, a supply part for delivering the solution to the nozzle, and a controller. This innovative design includes a tank, a conduit for guiding the solution, a pump, and a filter with distinct spaces for effective separation. The controller manages the flow of the processing solution through the filtering member, ensuring optimal performance.

The developing treatment apparatus is designed to perform developing treatments on substrates. It comprises a rotating and holding part for the substrate, a discharger for applying a predetermined solution, and a destaticizer that utilizes ionized X-rays to eliminate static charges from the solution. This combination of features allows for precise and efficient treatment of substrates.

Career Highlights

Seiichi Kure is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His role involves the development of innovative technologies that push the boundaries of substrate processing. His expertise and contributions have positioned him as a key figure in this specialized field.

Collaborations

Seiichi Kure has collaborated with notable colleagues, including Ryouichirou Naitou and Hideo Shite. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Seiichi Kure's work in substrate processing technology exemplifies the spirit of innovation. His patents and contributions to Tokyo Electron Limited highlight his commitment to advancing the field. His ongoing efforts continue to shape the future of substrate processing.

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