Company Filing History:
1 out of 42,517 
1 out of 87 Years Active: 1995
Title: Seiichi Ariga: Innovator in Semiconductor Technology
Introduction
Seiichi Ariga is a notable inventor based in Ohme, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the manufacturing of integrated circuit devices. His innovative approaches have led to advancements that enhance the performance and reliability of semiconductor components.
Latest Patents
Seiichi Ariga holds a patent for a method of manufacturing a semiconductor integrated circuit device. This patent describes a process for depositing a silicon oxide film that constitutes part of a final passivation film onto a bonding pad. The method involves dividing the silicon oxide depositing step into two stages. After the first deposition, the bonding pad is exposed by etching, followed by a second deposition. This technique ensures that a sufficient thickness of insulating film remains between the bottom of an aperture and the fuse element during subsequent etching processes. The patent highlights the importance of maintaining the integrity of the fuse element while conducting electrical tests.
Career Highlights
Throughout his career, Seiichi Ariga has worked with prominent companies in the semiconductor industry. He has been associated with Hitachi, Ltd. and Hitachi ULSI Engineering Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.
Collaborations
Seiichi Ariga has collaborated with notable colleagues in his field, including Keiichi Yoshizumi and Kazushi Fukuda. These collaborations have contributed to the advancement of semiconductor technologies and have fostered a spirit of innovation within the industry.
Conclusion
Seiichi Ariga's contributions to semiconductor technology through his innovative patent and collaborations with industry peers underscore his role as a significant inventor. His work continues to influence the development of reliable and efficient semiconductor devices.