Location History:
- Tokyo, JP (2011)
- Shinjyuku-ku, JP (2013)
Company Filing History:
Years Active: 2011-2013
Title: Seigo Ono: Innovator in Flow Measurement Technology
Introduction
Seigo Ono is a distinguished inventor based in Shinjyuku-ku, Japan. He has made significant contributions to the field of flow measurement technology, holding a total of 2 patents. His innovative designs focus on enhancing the efficiency and accuracy of flowmeters.
Latest Patents
Ono's latest patents include a Positive Displacement Flowmeter and a Helical Gear Flowmeter. The Positive Displacement Flowmeter features a pair of non-circular gears that operate in rolling contact on a pitch line without slippage. This design includes a casing and rotors that rotate around their center axes, utilizing an oval pitch curve for the tooth profile. The Helical Gear Flowmeter employs a pair of helical gears, utilizing an oval pitch curve as a reference rack tooth profile. The intricate mathematical relationships governing the tooth height ratio and moving radius are key to the functionality of these devices.
Career Highlights
Seigo Ono has dedicated his career to advancing flow measurement technologies. His work at Oval Corporation has positioned him as a leading figure in the industry. His innovative designs have not only improved existing technologies but have also paved the way for future advancements in flow measurement.
Collaborations
Ono collaborates with Katsuichi Uchida, contributing to the development of cutting-edge technologies in their field. Their partnership exemplifies the importance of teamwork in driving innovation.
Conclusion
Seigo Ono's contributions to flow measurement technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in this critical area of engineering.