Hikone, Japan

Seichi Ueno

This inventor holds 1 USPTO granted patent. Top assignee: Matsushita Electric Industrial Co., Ltd.. Active years: 1996.


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Seichi Ueno: Innovator in Refuse Treatment Technology

Introduction

Seichi Ueno is a notable inventor based in Hikone, Japan. He has made significant contributions to the field of refuse treatment technology. His innovative approach has led to the development of a unique apparatus designed to enhance the efficiency of waste management.

Latest Patents

Ueno holds a patent for a refuse treating apparatus. This invention involves a refuse container that is heated by a heater, allowing steam generated from the refuse to be condensed by a condenser. The system includes a first temperature detector that monitors the ambient temperature near the refuse container. The output of the heater is controlled based on this temperature to maintain a specific temperature. Additionally, a second temperature detector at the condenser measures the temperature of the steam. If the temperature change exceeds a predetermined value, the drying process is accurately terminated, preventing scorching.

Career Highlights

Seichi Ueno is associated with Matsushita Electric Industrial Co., Ltd., a company known for its commitment to innovation and technology. His work has contributed to advancements in refuse treatment, showcasing his expertise in this critical area.

Collaborations

Ueno has collaborated with notable colleagues, including Hirofumi Nishida and Hideaki Sakatani. Their combined efforts have furthered the development of effective waste management solutions.

Conclusion

Seichi Ueno's contributions to refuse treatment technology exemplify the importance of innovation in addressing environmental challenges. His patented apparatus represents a significant step forward in waste management efficiency.

Profile summary based on public USPTO records.
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