Allison Park, PA, United States of America

Seetha Eswarakrishnan


Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 1992-1998

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4 patents (USPTO):Explore Patents

Title: Seetha Eswarakrishnan: Innovator in Chemical Synthesis

Introduction

Seetha Eswarakrishnan is a notable inventor based in Allison Park, PA (US). He has made significant contributions to the field of chemical synthesis, holding a total of 4 patents. His work focuses on innovative methods and catalysts that enhance the efficiency and effectiveness of chemical processes.

Latest Patents

Among his latest patents is a method for the preparation of alpha-chlorinated chloroformates. This patent describes novel catalysts for synthesizing alpha-chlorinated chloroformates from aldehydes and phosgene. The catalysts include a variety of compounds such as alkyl substituted guanidines and phenyldialkyliminium tetraalkylguanidinium chlorides. Another significant patent involves the use of particulate ammonium phosphate of small size. This innovation demonstrates that small particles of ammonium dihydrogen phosphate can provide a higher Limiting Oxygen Index (LOI) to polyolefin compositions, improving various properties such as processability and tensile strength.

Career Highlights

Seetha Eswarakrishnan is currently employed at PPG Industries, Inc., where he continues to develop and refine his innovative ideas. His work has not only contributed to the company's success but has also advanced the field of chemical engineering.

Collaborations

Throughout his career, Seetha has collaborated with notable colleagues, including Carol L. Knox and Suresh B. Damle. These collaborations have fostered a productive environment for innovation and research.

Conclusion

Seetha Eswarakrishnan's contributions to chemical synthesis through his patents and collaborations highlight his role as a significant inventor in the industry. His work continues to influence advancements in chemical processes and materials.

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