Epernay sous Gevrey, France

Sebastien Very

This inventor holds 1 USPTO granted patent. Top assignee: Urgo Recherche Innovation Et Developpement. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sebastien Very. Retrieved from https://idiyas.com/inventor/sebastien-very

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovations by Sebastien Very

Introduction

Sebastien Very is an accomplished inventor based in Epernay sous Gevrey, France. He has made significant contributions to the field of medical technology, particularly in the development of dressings that facilitate the controlled release of medication.

Latest Patents

Sebastien Very holds a patent for a dressing that enables the controlled and prolonged release of metformin. This innovative dressing features an interface layer made from a weave coated with an elastomeric matrix containing metformin and its salts. The invention ensures that between 40 and 100% of the metformin is released within 72 hours, making it a valuable tool for wound healing.

Career Highlights

Sebastien Very is associated with Urgo Recherche Innovation Et Developpement, a company dedicated to advancing healthcare solutions. His work focuses on integrating innovative materials and technologies to improve patient outcomes.

Collaborations

Sebastien collaborates with talented professionals such as Claire Bouvier and Nathalie Derain, who contribute to the research and development efforts at Urgo.

Conclusion

Sebastien Very's innovative work in developing advanced dressings showcases his commitment to improving medical treatments. His contributions are paving the way for enhanced healing methods in the healthcare industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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