This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Oxford Instruments Nanotechnology Tools Limited. Active years: 2024.
Company Filing History:
Years Active: 2024
Title: Innovations of Sebastien Pochon in Charged Particle Beam Technology.
Introduction
Sebastien Pochon is an accomplished inventor based in Abingdon, GB. He has made significant contributions to the field of surface processing technology through his innovative work on charged particle beam sources. His expertise and creativity have led to the development of a patented technology that enhances surface processing methods.
Latest Patents
Sebastien Pochon holds a patent for a "Charged particle beam source, surface processing apparatus and surface processing method." This invention involves a charged particle beam source that includes a plasma chamber and a plasma generation unit. The unit is designed to convert an input gas into a plasma containing charged particles. The grid assembly adjacent to the plasma chamber opening is electrically biased to accelerate charged particles, resulting in a charged particle beam with a non-uniform current density profile.
Career Highlights
Sebastien Pochon is currently employed at Oxford Instruments Nanotechnology Tools Limited. His work at this company focuses on advancing nanotechnology tools and applications. With a patent portfolio that includes 1 patent, he has established himself as a key player in the field of surface processing technology.
Collaborations
Sebastien has collaborated with notable colleagues such as David Pearson and Joao Ferreira. Their combined expertise contributes to the innovative environment at Oxford Instruments Nanotechnology Tools Limited.
Conclusion
Sebastien Pochon's contributions to charged particle beam technology exemplify his dedication to innovation in surface processing methods. His patented work continues to influence advancements in the field, showcasing the importance of creativity and collaboration in technological development.