Cours de Pile, France

Sébastien Cuvelier

This inventor holds 1 USPTO granted patent and 3 published patent applications and 5 EPO patents. Top assignee: Eurenco. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sébastien Cuvelier. Retrieved from https://idiyas.com/inventor/sebastien-cuvelier

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Sébastien Cuvelier: Innovator in Paste Pattern Technology

Introduction

Sébastien Cuvelier is a notable inventor based in Cours de Pile, France. He has made significant contributions to the field of technology, particularly with his innovative patent related to paste pattern deposition.

Latest Patents

Sébastien holds a patent for a "Device for laying paste patterns in a tube." This device is designed for depositing paste patterns on the surface of the channel of a tube. It comprises a frame that supports a first mechanical assembly for holding, positioning, and moving the tube, along with a second mechanical assembly for extruding paste. These assemblies work in cooperation to achieve precise paste pattern deposition.

Career Highlights

Throughout his career, Sébastien has worked with prominent companies such as Eurenco and Eurenco France Sas. His experience in these organizations has allowed him to refine his skills and contribute to various projects in the field of technology.

Collaborations

Sébastien has collaborated with talented individuals, including Bastien Chautar and Julien Loyer. These partnerships have fostered innovation and creativity in his work.

Conclusion

Sébastien Cuvelier is a dedicated inventor whose work in paste pattern technology showcases his innovative spirit and commitment to advancing the field. His contributions are a testament to the importance of creativity in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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