Schaftlach, Germany

Sebastian Wetter

This inventor holds 1 USPTO granted patent. Top assignee: Giesecke+devrient Currency Technology Gmbh. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sebastian Wetter. Retrieved from https://idiyas.com/inventor/sebastian-wetter

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Sebastian Wetter: Innovator in Pigment Production

Introduction

Sebastian Wetter is a notable inventor based in Schaftlach, Germany. He has made significant contributions to the field of pigment production, particularly through his innovative methods.

Latest Patents

Sebastian Wetter holds a patent for a "Method for producing platelet-shaped pigments." This method involves several steps, including providing a film structure with a carrier substrate, a water-soluble release layer, and a pigment material layer. The process includes mechanically disrupting the pigment material layer at specific locations, soaking the film structure with an aqueous solution, and applying mechanical force to detach the pigment material layer from the carrier substrate, resulting in a plurality of pigments.

Career Highlights

Sebastian Wetter is currently employed at Giesecke+Devrient Currency Technology GmbH, where he continues to develop and refine his innovative techniques in pigment production. His work has garnered attention for its potential applications in various industries.

Collaborations

Sebastian collaborates with talented coworkers, including Maik Rudolf Johann Scherer and Kai Herrmann Scherer, who contribute to the innovative environment at Giesecke+Devrient.

Conclusion

Sebastian Wetter's contributions to the field of pigment production through his patented methods highlight his role as an influential inventor. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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