Heppenheim, Germany

Sebastian Saul

This inventor holds 1 USPTO granted patent. Top assignee: Dentsply Sirona Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sebastian Saul. Retrieved from https://idiyas.com/inventor/sebastian-saul

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Sebastian Saul and His Additive Manufacturing Patent.

Introduction

Sebastian Saul is an inventor associated with Heppenheim, Germany, and Dentsply Sirona Inc. His patent work concerns additive manufacturing using UV-curable resin.

Latest Patents

Saul is credited with 1 patent, titled “Additive Manufacturing Apparatus with Optical Means for Diffusing/Scattering Projected UV Light Towards Photocurable Resin.” The invention describes an apparatus that forms components by curing resin layer by layer. It includes a resin vat with a UV-transparent window, a projection unit that directs UV light through the window, and a movable building platform. An optical means in the light path diffuses the projected light toward the platform and the region where the resin is cured.

Career Highlights

The patent reflects Saul’s work on optical arrangements for resin-based additive manufacturing. Its design combines a UV-transparent plate and flexible anti-adhesive foil with an optical means intended to distribute projected light toward the curing region.

Collaborations

Saul is associated with Dentsply Sirona Inc. His coworker, Christoph Brandes, is also identified in the provided information.

Conclusion

Sebastian Saul’s patent focuses on directing and diffusing UV light in a resin-based additive manufacturing apparatus, highlighting an approach to layerwise component production.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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