Seaung Suk Lee

Title: Innovations of Seaung Suk Lee

Introduction

Seaung Suk Lee is a notable inventor based in Bubaleub, South Korea. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his expertise and innovative spirit.

Latest Patents

One of his latest patents is a method for fabricating semiconductor devices. This method involves creating highly integrated semiconductor devices with capacitors that have a dielectric film made of a thin film exhibiting a high dielectric constant. The process includes forming an under electrode over a wafer with an oxide film at high temperatures and annealing the wafer in a vacuum. This results in a tight and smooth structure for the under electrode, facilitating subsequent processing steps and improving the reliability and uniformity of semiconductor devices.

Another significant patent is the hot-wall CVD method for forming a ferroelectric film. This invention provides a method for creating ferroelectric films using a hot-wall chemical vapor deposition apparatus. The process includes heating the processing tube and receptacles containing ferroelectric source materials, loading wafers, and conveying vaporized gases to a mixing chamber. The method allows for precise control of reaction speed and the deposition of mixed gases onto the wafers.

Career Highlights

Seaung Suk Lee is currently employed at Hyundai Electronics Industries Co. Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of electronic devices.

Collaborations

He has collaborated with notable coworkers, including Ho Gi Kim and Jong Choul Kim, contributing to a dynamic and innovative work environment.

Conclusion

Seaung Suk Lee's contributions to semiconductor technology through his patents reflect his dedication to innovation and excellence in the field. His work continues to influence the development of advanced electronic devices.