Lynn, MA, United States of America

Sean S Sullivan

USPTO Granted Patents = 2 

Average Co-Inventor Count = 6.9

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017-2025

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2 patents (USPTO):Explore Patents

Title: Innovations of Sean S Sullivan

Introduction

Sean S Sullivan is an accomplished inventor based in Lynn, MA (US). He has made significant contributions to the field of additive manufacturing and materials science. With a total of two patents to his name, Sullivan's work showcases his innovative approach to solving complex problems in technology.

Latest Patents

Sullivan's latest patents include a groundbreaking development in conductive photo-curable compositions for additive manufacturing. This invention involves a photo-curable composition that comprises at least one photocurable monomer or oligomer, a photoinitiator for polymerization, and CNS-derived materials. The resulting polymerized composition boasts a volume resistivity no greater than 10 ohm·cm, making it highly effective for various applications. Another notable patent is for treated fumed silica, which includes treated fumed silica particles with a modified polydialkylsiloxane on their surface. This invention also details a method for preparing these particles and their use in toner compositions.

Career Highlights

Sean S Sullivan is currently employed at Cabot Corporation, where he continues to push the boundaries of innovation. His work at Cabot Corporation has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to technology.

Collaborations

Sullivan has worked alongside notable colleagues such as Angelica M Sanchez Garcia and Elizabeth Sims. Their collaborative efforts have played a crucial role in advancing their projects and achieving successful outcomes.

Conclusion

Sean S Sullivan's innovative spirit and dedication to his work have led to significant advancements in additive manufacturing and materials science. His patents reflect a commitment to developing solutions that address modern technological challenges.

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