The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2025
Filed:
Sep. 01, 2021
Cabot Corporation, Boston, MA (US);
Xiaofeng Zhang, Shrewsbury, MA (US);
Han Zhang, Burlington, MA (US);
Sean S. Sullivan, Lynn, MA (US);
Limeng Chen, Arlington, MA (US);
Angelica M. Sanchez Garcia, Somerville, MA (US);
Agathagelos Kyrlidis, Cambridge, MA (US);
Tushar Shah, Fulton, MD (US);
Yakov E. Kutsovsky, Arlington, MA (US);
Darragh Fitzpatrick, County Kildare, IE;
Rachel Hersee, Dublin, IE;
Pablo Walter, Cologne, DE;
Cabot Corporation, Boston, MA (US);
Abstract
A photo-curable composition for use in additive manufacturing, said composition comprising: a) at least one photocurable monomer or oligomer; b) a photoinitiator for polymerization of the monomer; and, from 0.01 to 1 wt. %, based on the weight of the composition, of c) CNS-derived materials. Following polymerization, the resulting polymerized composition has a volume resistivity no greater than 10ohm·cm.