Sean Frink

Title: Sean Frink - Innovator in Chemical-Mechanical Polishing

Introduction

Sean Frink is an accomplished inventor based in Penn Yan, NY (US). He has made significant contributions to the field of chemical-mechanical polishing (CMP) through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of CMP processes, particularly in the semiconductor industry.

Latest Patents

Sean Frink holds a patent for "Auto-stopping slurries for chemical-mechanical polishing of topographic dielectric silicon dioxide." This invention provides auto-stopping CMP slurry compositions that minimize post-CMP non-uniformity. It also extends the time that polishing can be continued beyond the end point without the risk of over-polishing the dielectric silicon dioxide film. The auto-stopping CMP slurry compositions include ceria abrasive particles and an effective amount of a polyalkylamine, such as polyethyleneimine, dispersed in water.

Career Highlights

Sean Frink is currently employed at Ferro Corporation, where he applies his expertise in CMP technologies. His innovative approach has led to advancements in the polishing processes used in semiconductor manufacturing. His work is crucial in ensuring the quality and reliability of dielectric silicon dioxide films.

Collaborations

Sean has collaborated with notable colleagues, including Eric Oswald and Bradley M Kraft. Their combined efforts contribute to the ongoing development of innovative solutions in the field of chemical-mechanical polishing.

Conclusion

Sean Frink is a notable inventor whose work in CMP technology has made a significant impact on the semiconductor industry. His innovative patent demonstrates his commitment to advancing the field and improving manufacturing processes.