Secaucus, NJ, United States of America

Sean Doyle

This inventor holds 1 USPTO granted patent. Top assignee: Amd Design, LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sean Doyle. Retrieved from https://idiyas.com/inventor/sean-doyle-cphwwt93

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Sean Doyle - Innovator in Server Rack Technology

Introduction

Sean Doyle is an accomplished inventor based in Secaucus, NJ (US). He has made significant contributions to the field of server technology, particularly with his innovative designs aimed at improving airflow and air quality in server racks.

Latest Patents

Sean Doyle holds a patent for a "Variable blanking panel for server racks." This invention provides an apparatus and method for varying air flow into a specific rack space from the cold aisle. The blanking panel includes rotatable blades that can be adjusted between open and closed positions, allowing for control over the airflow. Additionally, the blades are made from a material that changes condition in the presence of moisture or contaminants, thereby indicating air quality.

Career Highlights

Sean is currently employed at Amd Design, LLC, where he continues to develop innovative solutions for the tech industry. His work focuses on enhancing the efficiency and effectiveness of server environments, which is crucial for modern data centers.

Collaborations

Sean collaborates with talented professionals such as Sruti Chigullapalli and Karan Mehta, contributing to a dynamic team that drives innovation in their projects.

Conclusion

Sean Doyle's contributions to server rack technology exemplify the importance of innovation in enhancing operational efficiency. His patent for the variable blanking panel showcases his commitment to improving air quality and airflow management in server environments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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