Sean D Burns

Title: Sean D Burns: Innovator in Semiconductor Technology

Introduction

Sean D Burns is a notable inventor based in Hopewell Junction, NY (US). He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approaches to etching and pattern formation.

Latest Patents

One of his latest patents is titled "Alternating hardmasks for tight-pitch line formation." This patent describes a method for forming fins that includes creating a three-color hardmask fin pattern on a fin base layer. The process involves selectively etching fins of different colors while ensuring that at least one fin of the first color remains intact. This innovative method enhances the precision of fin formation in semiconductor devices.

Another significant patent by Burns is "Self aligned pattern formation post spacer etchback in tight pitch configurations." This patent outlines a method for creating an etch mask structure by forming dielectric spacers on the sidewalls of mandrel structures. The process allows for the selective removal of structures to provide an effective etch mask, facilitating the creation of intricate patterns in semiconductor manufacturing.

Career Highlights

Throughout his career, Sean D Burns has worked with prominent companies in the semiconductor industry, including Adeia Semiconductor Solutions LLC and Tessera LLC. His experience in these organizations has contributed to his expertise in developing advanced semiconductor technologies.

Collaborations

Some of his notable coworkers include Nelson M Felix and Chi-Chun Liu. Their collaboration has likely fostered an environment of innovation and creativity in their respective projects.

Conclusion

Sean D Burns is a distinguished inventor whose work in semiconductor technology has led to valuable patents that enhance manufacturing processes. His contributions continue to influence the industry and pave the way for future innovations.