Cambridge, MA, United States of America

Sean C O'Hern


Average Co-Inventor Count = 8.7

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Cambridge, MA (US) (2018 - 2021)
  • Watertown, MA (US) (2020 - 2023)

Company Filing History:


Years Active: 2018-2023

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4 patents (USPTO):

Title: Innovations of Sean C O'Hern

Introduction

Sean C O'Hern is a notable inventor based in Cambridge, MA, with a focus on advanced materials and filtration technologies. He holds a total of four patents that showcase his innovative contributions to the field of membrane technology and two-dimensional materials.

Latest Patents

One of his latest patents involves mitigating leaks in membranes through the use of two-dimensional material-based filters. This invention discloses a membrane that includes an active layer with a plurality of defects, where a deposited material associated with these defects reduces flow through the membrane. In another embodiment, the membrane features a porous substrate with an atomic layer deposited material that is less hydrophilic than the substrate, enhancing its functionality. Additionally, he has developed a graphene-based filter that includes at least one active layer on a porous substrate, designed to limit flow through defects and intrinsic pores, thereby improving filtration efficiency.

Career Highlights

Sean has worked at prestigious institutions such as the Massachusetts Institute of Technology and King Fahd University of Petroleum and Minerals. His experience in these organizations has significantly contributed to his expertise in material science and engineering.

Collaborations

Throughout his career, Sean has collaborated with notable colleagues, including Rohit Nandkumar Karnik and Michael S H Boutilier. These collaborations have further enriched his research and development efforts in innovative technologies.

Conclusion

Sean C O'Hern's work in membrane technology and two-dimensional materials exemplifies his commitment to innovation and advancement in the field. His patents reflect significant contributions that have the potential to impact various applications in filtration and material science.

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