Seoul, South Korea

Seachul Bae

This inventor holds 1 USPTO granted patent. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seachul Bae. Retrieved from https://idiyas.com/inventor/seachul-bae-161p0ej5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Seachul Bae: Innovator in Fixing Device Technology

Introduction

Seachul Bae is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of fixing device technology, particularly through his innovative patent. His work is recognized for its practical applications in various industries.

Latest Patents

Seachul Bae holds a patent for a "Fixing device comprising nip plate treated with electron beam injected fluorinated resins." This invention includes a pressing member with a nip plate, where an electron beam-irradiated fluorinated resin film is applied to the outer surface of the nip plate that faces the backup member. This technology enhances the performance and durability of fixing devices.

Career Highlights

Seachul Bae is currently employed at Hewlett-Packard Development Company, L.P. His role at this esteemed company allows him to further develop and refine his innovative ideas. His dedication to advancing technology in fixing devices has positioned him as a key player in his field.

Collaborations

Seachul has collaborated with talented coworkers, including Sunhyung Lee and Jaehyeok Jang. Their combined expertise contributes to the success of their projects and innovations.

Conclusion

Seachul Bae's contributions to fixing device technology through his patent and work at Hewlett-Packard Development Company, L.P. highlight his role as an influential inventor. His innovative spirit continues to drive advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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