Cheonan, South Korea

Se Won Lee

This inventor holds 1 USPTO granted patent. Top assignee: Semes Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Se Won Lee. Retrieved from https://idiyas.com/inventor/se-won-lee-xc9t8132

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Se Won Lee

Introduction

Se Won Lee is a notable inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of substrate treatment technology. His work is characterized by a focus on improving the efficiency and effectiveness of substrate processing.

Latest Patents

Se Won Lee holds a patent for a nozzle assembly, which is part of a substrate treatment apparatus. This innovative apparatus includes a chuck that supports a substrate and is rotatable. It also features a container that surrounds the chuck, collecting chemicals that may scatter due to the substrate's rotations. Additionally, the apparatus is equipped with a first spray nozzle that sprays chemicals onto the substrate, enhancing the treatment process. This patent showcases his commitment to advancing technology in substrate treatment.

Career Highlights

Throughout his career, Se Won Lee has demonstrated a strong dedication to innovation. His work at Semes Co., Ltd. has positioned him as a key player in the development of advanced substrate treatment solutions. His expertise and contributions have been instrumental in the company's success in this specialized field.

Collaborations

Se Won Lee collaborates with talented individuals such as Yong Hee Lee and Jae Yong Kim. Together, they work on various projects that aim to push the boundaries of substrate treatment technology.

Conclusion

Se Won Lee's innovative spirit and dedication to his work have led to significant advancements in substrate treatment technology. His patent and contributions at Semes Co., Ltd. reflect his commitment to excellence in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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