Gumi, South Korea

Se Jun Hwang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Kolon Glotech, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Se Jun Hwang. Retrieved from https://idiyas.com/inventor/se-jun-hwang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Se Jun Hwang: Innovator in Artificial Turf Technology

Introduction

Se Jun Hwang is a notable inventor based in Gumi, South Korea. He has made significant contributions to the field of artificial turf technology. His innovative designs aim to enhance the performance and durability of artificial surfaces.

Latest Patents

Hwang holds a patent for an "Artificial turf structure having improved buffering performance." This invention features a unique design that includes a protective layer, a buffer layer with a three-dimensional structure, a bubble layer, a pile unit, and a backing layer. The combination of these elements ensures improved performance and longevity of artificial turf.

Career Highlights

Se Jun Hwang is associated with Kolon Glotech, Inc., where he applies his expertise in developing advanced materials and technologies. His work has been instrumental in pushing the boundaries of artificial turf applications.

Collaborations

Hwang collaborates with talented individuals such as Kwang Su Cho and Eun Seon Jeong. Their combined efforts contribute to the innovative projects at Kolon Glotech, Inc.

Conclusion

Se Jun Hwang's contributions to artificial turf technology exemplify the impact of innovation in enhancing sports and recreational surfaces. His patent reflects a commitment to improving performance and user experience in artificial environments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…