Suwon-si, South Korea

Se Il Oh

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Sdi., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Se Il Oh. Retrieved from https://idiyas.com/inventor/se-il-oh-tbixweav

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Se Il Oh: Innovator in Photosensitive Resin Technology

Introduction

Se Il Oh is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of photosensitive resin technology, particularly in the development of innovative materials used in color filters.

Latest Patents

Se Il Oh holds a patent for a "Photosensitive resin composition, and photosensitive resin film and color filter manufactured by using the same." This invention includes a photosensitive resin composition that comprises a colorant, a binder resin, a photopolymerizable compound, a photopolymerization initiator, a matting agent, and a solvent. The composition is designed to enhance the performance of color filters, making it a valuable asset in the electronics industry.

Career Highlights

Se Il Oh is currently employed at Samsung SDI, Ltd., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of photosensitive materials, which are crucial for various applications in electronics.

Collaborations

Throughout his career, Se Il Oh has collaborated with talented individuals such as Kyoungsoo Park and Sunghoon Park. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Se Il Oh's contributions to the field of photosensitive resin technology exemplify the impact of innovation in modern electronics. His work not only enhances product performance but also paves the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…