Yongin-si, South Korea

Se Hun Park

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Se Hun Park. Retrieved from https://idiyas.com/inventor/se-hun-park-uscniy1v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Se Hun Park and Curved-Substrate Cleaning Technology.

Introduction

Se Hun Park is an inventor based in Yongin-si, South Korea, and is associated with Samsung Display Co., Ltd. His work includes an invention for cleaning curved substrates, addressing the challenge of keeping a curved surface properly positioned during cleaning.

Latest Patents

Park is credited with 1 patent: “Cleaning System and Method for a Curved Substrate.” The system uses a pressure-type cleaning unit to clean a selected area of a curved target substrate. A detachable support body holds the cleaning unit at a set height, while a clamping and height-adjustment mechanism helps maintain the cleaning area in a predetermined orientation. A moving unit shifts the substrate-supporting mechanism back and forth relative to the cleaning unit.

Career Highlights

Park’s listed patent focuses on equipment and methods for cleaning curved substrates. The design combines pressure-based cleaning with adjustable support and controlled movement to help maintain the target area’s orientation during the process.

Collaborations

Park’s listed coworkers include Jinwook Yang and Jongwon Park. The patent information provided identifies Samsung Display Co., Ltd. as his company.

Conclusion

Se Hun Park’s patent describes a coordinated approach to cleaning curved substrates by combining pressure, adjustable support, and controlled movement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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