Company Filing History:
Years Active: 2016
Title: Inventor Spotlight: Se-Chan Lim from Boryeong-si, KR
Introduction
Se-Chan Lim is an innovative inventor based in Boryeong-si, South Korea. He has made notable contributions to the field of semiconductor technology, evidenced by his patented invention that addresses key challenges in the manufacturing of semiconductor devices.
Latest Patents
Se-Chan Lim holds a patent for "Semiconductor devices including raised source/drain stressors and methods of manufacturing the same". This patent describes a semiconductor device that incorporates a gate structure featuring a gate insulating layer and a gate electrode on a semiconductor substrate. The invention includes gate spacers on the sidewalls of the gate structure, and a stressor pattern with an impurity region adjacent to the gate structure. Notably, the stressor pattern features a protruded portion with a top surface higher than the gate structure, showcasing a slanted facet angle that interacts with gate spacers to form a concave portion. Moreover, a blocking insulating layer and an insulating wing pattern enhance the overall functionality of the device.
Career Highlights
Se-Chan Lim is currently employed at Samsung Electronics Co., Ltd., a leading global technology company known for its advancements in electronics and semiconductor manufacturing. His role within the company allows him to push the boundaries of technology and innovation in this critical sector.
Collaborations
Throughout his career, Se-Chan Lim has collaborated with fellow inventors such as Sang-Pil Sim and Dong-Kyun Sohn. Together, they contribute to the dynamic field of semiconductor technology, fostering innovation and developing cutting-edge solutions.
Conclusion
Se-Chan Lim's work exemplifies the spirit of innovation inherent in the semiconductor industry. With his patented technology, he continually contributes to advancements that shape the future of electronic devices. His collaboration with talented individuals at Samsung Electronics Co., Ltd. illustrates the importance of teamwork in driving technological progress.