Dublin, Ireland

Seán Kelly

This inventor holds 1 USPTO granted patent. Top assignee: Dublin City University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seán Kelly. Retrieved from https://idiyas.com/inventor/seán-kelly

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Seán Kelly: Plasma Measurement Innovation

Introduction

Seán Kelly is an inventor based in Dublin, Ireland, associated with Dublin City University. His work includes an invention for measuring characteristics of plasma systems without invasive contact.

Latest Patents

Kelly is named on 1 patent, titled “Non-invasive measurement of plasma systems.” The invention describes a method and system for measuring plasma or plasma-chamber characteristics, including plasma power and pressure. An antenna for Radio Emission Spectroscopy is positioned outside the chamber, where it receives electromagnetic radiation passing through a viewport or radiation-permeable surface. The system measures signals in the near-field electric and magnetic regions and uses changes in those signals to determine changes in the plasma characteristic. The method also accounts for signals associated with multiple powered RF electrodes that can be independently modulated.

Career Highlights

Kelly’s patent work addresses non-invasive plasma measurement, using electromagnetic emissions to assess conditions within a plasma chamber. This approach may enable monitoring without placing measurement equipment inside the chamber.

Collaborations

Kelly is associated with Dublin City University. His listed coworkers include Patrick Mcnally and David Coates.

Conclusion

Seán Kelly’s patent describes a non-invasive approach to measuring plasma power or pressure through signals detected outside a plasma chamber.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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