The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2026
Filed:
Oct. 11, 2021
Dublin City University, Dublin, IE;
Patrick Mcnally, County Dublin, IE;
David Coates, Dublin, IE;
Niall Macgearailt, County Dublin, IE;
Seán Kelly, Dublin, IE;
Rajani K. Vijayaraghavan, County Dublin, IE;
DUBLIN CITY UNIVERSITY, , IE;
Abstract
The invention provides a system and method for measuring a characteristic of a plasma or a plasma chamber, wherein the plasma chamber has a viewport or a surface which is permeable to electromagnetic radiation such that at least a portion of the electromagnetic radiation emitted by the plasma in the plasma chamber passes through the viewport, the method comprising providing the antenna of a Radio Emission Spectroscopy, RES, plasma bulk system externally to the plasma chamber to absorb at least a portion of the electromagnetic radiation that has passed through the viewport and configured to measure signals in the near-field E- and B-field regions; measuring a first value based on the signal induced in the antenna wherein the signal is obtained from a plurality of powered RF electrodes configured to be independently modulated with one or more power sources; and calculating a second value indicative of a change of magnitude of the characteristic based on a change of magnitude of the first value, wherein the characteristic is plasma power and/or plasma pressure.