Scott W Morrison

Title: Scott W Morrison: Innovator in Plasma Deposition Technologies

Introduction

Scott W Morrison is a notable inventor based in Cambridge, MA (US). He has made significant contributions to the field of plasma deposition technologies, particularly through his innovative methods involving cyclic siloxanes. With a total of 2 patents, Morrison's work has advanced the understanding and application of polymer deposition techniques.

Latest Patents

Morrison's latest patents include "Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles." These patents provide methods that involve flowing a precursor gas in proximity to a substrate within a Plasma-Enhanced Chemical Vapor Deposition (PECVD) reactor. The precursor gas comprises an initiator and at least one monomer that includes a cyclic siloxane and at least two vinyl groups. This process results in the deposition of a polymer formed from the monomer on the substrate.

Career Highlights

Scott W Morrison is associated with Gvd Corporation, where he applies his expertise in plasma deposition technologies. His work has been instrumental in developing advanced materials and processes that have applications in various industries.

Collaborations

Morrison has collaborated with notable colleagues, including W Shannan O'Shaughnessy and R Austin Nowak. These collaborations have fostered innovation and contributed to the advancement of their shared research interests.

Conclusion

Scott W Morrison's contributions to the field of plasma deposition technologies highlight his role as an influential inventor. His innovative methods and collaborations continue to shape the future of polymer deposition processes.