The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Dec. 13, 2018
Applicant:
Gvd Corporation, Cambridge, MA (US);
Inventors:
W. Shannan O'Shaughnessy, Cambridge, MA (US);
Scott W. Morrison, Cambridge, MA (US);
R. Austin Nowak, Cambridge, MA (US);
Assignee:
GVD CORPORATION, Cambridge, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/00 (2006.01); C23C 16/40 (2006.01); C23C 16/505 (2006.01); H01L 21/02 (2006.01); A61N 1/00 (2006.01); C23C 16/50 (2006.01); C08G 77/04 (2006.01); C08J 5/18 (2006.01); C08K 5/14 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02274 (2013.01); A61N 1/00 (2013.01); B05D 1/62 (2013.01); C08G 77/045 (2013.01); C08J 5/18 (2013.01); C08K 5/14 (2013.01); C23C 16/401 (2013.01); C23C 16/50 (2013.01); C23C 16/505 (2013.01); H01L 21/02118 (2013.01); H01L 21/02126 (2013.01); H01L 21/02216 (2013.01); B05D 2518/10 (2013.01); C08J 2383/07 (2013.01); C23C 2222/20 (2013.01);
Abstract
Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the methods comprise flowing a precursor gas in proximity to a substrate within a PECVD reactor, wherein the precursor gas comprises an initiator and at least one monomer comprising a cyclic siloxane and at least two vinyl groups, and depositing a polymer formed from the at least one monomer on the substrate.