Company Filing History:
Years Active: 2022-2023
Title: R Austin Nowak: Innovator in Plasma Deposition Technologies
Introduction
R Austin Nowak is a notable inventor based in Cambridge, MA (US), recognized for his contributions to the field of plasma deposition technologies. With a total of 2 patents, he has made significant advancements in methods for depositing polymers using cyclic siloxanes.
Latest Patents
His latest patents include innovative methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles. These methods involve flowing a precursor gas in proximity to a substrate within a Plasma-Enhanced Chemical Vapor Deposition (PECVD) reactor. The precursor gas contains an initiator and at least one monomer that includes a cyclic siloxane with at least two vinyl groups. This process results in the deposition of a polymer formed from the monomer onto the substrate.
Career Highlights
R Austin Nowak is currently associated with GVD Corporation, where he continues to develop and refine his innovative techniques. His work has positioned him as a key figure in the advancement of polymer deposition technologies.
Collaborations
He collaborates with talented individuals such as W Shannan O'Shaughnessy and Scott W Morrison, contributing to a dynamic and innovative work environment.
Conclusion
R Austin Nowak's contributions to plasma deposition technologies through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in polymer applications.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.