Riverdale, IL, United States of America

Scott P Letellier

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Rockwell International Corporation. Active years: 1990.


% Patents Active = 100.0


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1990

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Scott P Letellier: Innovator in Microprocessor-Based Control Systems

Introduction

Scott P Letellier is a notable inventor based in Riverdale, IL (US). He has made significant contributions to the field of printing technology, particularly through his innovative patent related to microprocessor-based control systems.

Latest Patents

Letellier holds a patent for a "Microprocessor-based press dampening control." This control system for an offset printing press includes a microprocessor-based dampener, register, and ink processor. It effectively manages color register, ink rate, and damp rate. The system allows for damprate curve data, flood requests, and adjustments to individual nozzles on the spraybar to be downloaded from a master workstation to the drink processor. This technology is used to control the rate at which the spraybar nozzles are pulsed on and the duration that each separate nozzle remains on.

Career Highlights

Scott P Letellier has worked at Rockwell International Corporation, where he has been able to apply his expertise in control systems. His work has contributed to advancements in printing technology, enhancing the efficiency and quality of printed materials.

Collaborations

Letellier has collaborated with notable coworkers, including Kurt D Michl and Allen L Mitchell, who have also contributed to the field of printing technology.

Conclusion

Scott P Letellier's innovative work in microprocessor-based control systems has made a significant impact on the printing industry. His contributions continue to influence advancements in technology and efficiency in printing processes.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…