Sugarland, TX, United States of America

Scott K Beall


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Scott K Beall: Innovator in Valve Technology

Introduction

Scott K Beall is a notable inventor based in Sugarland, TX (US). He has made significant contributions to the field of valve technology, particularly with his innovative designs that enhance the functionality and efficiency of gate valves.

Latest Patents

Scott K Beall holds 1 patent for his invention titled "Parallel expanding gate valve." This patent describes an apparatus and methods for sealing a parallel expanding gate valve using upper and lower wedges that are separate from and located between the gate segments. The design features symmetrical gate segments with inner upper and lower tapered surfaces. The inclined surfaces on the upper wedge press against the inner upper tapered surfaces of the gate segments, while the inner lower tapered surfaces press against inclined wedging surfaces on the lower wedge. This innovative wedging action forces the gate segments outward with substantial force against sealing assemblies, effectively closing and sealing the gate valve.

Career Highlights

Scott K Beall is currently employed at Baroid Technology, Inc., where he continues to develop and refine his inventions. His work has been instrumental in advancing valve technology, making significant improvements in sealing mechanisms and operational efficiency.

Collaborations

Throughout his career, Scott has collaborated with talented individuals such as Tri C Le and Paul L Tasson. These collaborations have contributed to the successful development of his innovative technologies.

Conclusion

Scott K Beall's contributions to valve technology exemplify the spirit of innovation and problem-solving in engineering. His patent for the parallel expanding gate valve showcases his ability to create effective solutions that enhance industrial applications.

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