This inventor holds 2 USPTO granted patents. Top assignee: Ecolab Inc.. Active years: 2004-2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004-2005
Title: Scott I DeFields: Innovator in Stain Resistance Technology
Introduction
Scott I DeFields is a notable inventor based in Oakdale, MN (US). He has made significant contributions to the field of stain resistance technology, holding 2 patents that showcase his innovative approach to solving common problems associated with stains.
Latest Patents
One of his latest patents is a stain-resistant coating composition. This invention imparts iodine or iodophor stain resistance to surfaces by applying a hardenable coating composition that contains a reducing agent. This reducing agent has a redox potential sufficient to decolorize an iodine or iodophor stain. The reaction with the triiodide anion in the stain changes its coloration from a yellowish hue to a lighter hue, which can eventually cause the stain to disappear over time. Another significant patent is a masking agent for iodine stains. This invention involves applying sufficient starch to the stain to impart a bluer coloration, effectively masking the stain. The masked stain can remain until further cleaning or surface repair takes place, making it less objectionable in appearance.
Career Highlights
Scott I DeFields is currently employed at Ecolab Inc., where he continues to develop innovative solutions in the field of stain resistance. His work has contributed to advancements in cleaning technologies and has had a positive impact on various industries.
Collaborations
Some of his coworkers include Kim R Smith and Keith Edward Olson, who collaborate with him on various projects within the company.
Conclusion
Scott I DeFields is a dedicated inventor whose work in stain resistance technology has led to practical solutions for everyday challenges. His contributions continue to influence the industry and improve cleaning processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile