Lebanon, PA, United States of America

Scott Davies

This inventor holds 1 USPTO granted patent. Top assignee: Van Tongeren America LLC. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Scott Davies. Retrieved from https://idiyas.com/inventor/scott-davies-k9ulhwwy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Scott Davies - Innovator in Cyclone Separator Technology

Introduction

Scott Davies is a notable inventor based in Lebanon, PA (US). He has made significant contributions to the field of engineering, particularly in the design of cyclone separators. His innovative approach has led to the development of a unique patent that addresses key challenges in particle separation.

Latest Patents

Scott Davies holds a patent for a cyclone separator with flow-altering baffles. This invention includes a cyclone separator wall and a hopper wall that define an interior space. The design features a plurality of baffles located within the interior space, which assist in minimizing particle re-entrainment, reducing erosion, and decreasing pressure losses. This patent showcases his commitment to improving industrial processes.

Career Highlights

Scott Davies is currently employed at Van Tongeren America LLC, where he applies his expertise in engineering and innovation. His work at the company has allowed him to further develop his skills and contribute to advancements in cyclone separator technology.

Collaborations

Scott collaborates with talented individuals such as James F. Miller and Adam Brandt. Their teamwork fosters an environment of creativity and innovation, leading to the development of effective solutions in their field.

Conclusion

Scott Davies is a dedicated inventor whose work in cyclone separator technology has made a significant impact. His patent and collaborations reflect his commitment to innovation and excellence in engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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