Mountain View, CA, United States of America

Scott D Penner


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Scott D. Penner: Innovator in Metrology Systems

Introduction

Scott D. Penner is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of metrology, particularly through his innovative patent that enhances the functionality of metrology units. His work is characterized by a focus on automated systems that improve measurement accuracy and reliability.

Latest Patents

Scott D. Penner holds a patent for an "Automated system check for metrology unit." This invention involves a metrology unit that includes an integrated reference target, which is utilized in an automated system check process. The process measures a feature on the reference target and determines if the measurement falls within the desired specifications for the metrology unit. If the unit fails the automated system check, an automated diagnosis process can be performed using the same reference target. This innovation optimizes both the automated qualification and diagnosis processes based on correlations between various parameters.

Career Highlights

Scott D. Penner is currently employed at Nanometrics Inc., where he applies his expertise in metrology systems. His work at the company has been instrumental in advancing the technology used in precision measurement and diagnostics. With a focus on innovation, he continues to contribute to the development of cutting-edge solutions in the field.

Collaborations

Scott has collaborated with notable colleagues, including Pablo I. Rovira and Jaime Poris. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in metrology technology.

Conclusion

Scott D. Penner is a distinguished inventor whose work in automated metrology systems has made a significant impact in the field. His innovative patent demonstrates his commitment to enhancing measurement accuracy and reliability. Through his career at Nanometrics Inc., he continues to push the boundaries of technology in metrology.

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