Location History:
- Tokyo, JP (2007 - 2008)
- Tokyo-to, JP (2010)
Company Filing History:
Years Active: 2007-2010
Title: Sayaka Kawashima: Innovator in Barrier Film Technology
Introduction
Sayaka Kawashima is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of barrier film technology, holding a total of 4 patents. Her work focuses on developing materials that enhance transparency and barrier properties, which are crucial in various applications.
Latest Patents
Kawashima's latest patents include innovative solutions such as a barrier film designed to provide exceptional barrier properties while maintaining good transparency. This barrier film consists of a base material film and a barrier layer that includes a water repellent layer and a dense layer. The water repellent layer is a silicon oxide carbide film with specific atomic percentages of Si, O, and C, while the dense layer also comprises silicon oxide carbide with its own atomic composition. Another notable patent is for a gas barrier substrate that achieves high gas barrier properties without imperfections like ruggedness or pinholes. This substrate features a base material, a planarization layer, and a gas barrier layer formed through deposition.
Career Highlights
Kawashima has worked with notable companies, including Dai Nippon Printing Co., Ltd. Her experience in these organizations has allowed her to refine her expertise in barrier film technology and contribute to advancements in the field.
Collaborations
Some of her coworkers include Minoru Komada and Shinya Satou, who have collaborated with her on various projects.
Conclusion
Sayaka Kawashima's innovative work in barrier film technology showcases her dedication to enhancing material properties for practical applications. Her patents reflect her commitment to advancing the field and addressing industry needs.