Shizuoka, Japan

Saya Yoneyama

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Rolic Ag. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Saya Yoneyama. Retrieved from https://idiyas.com/inventor/saya-yoneyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Saya Yoneyama: Innovator in Liquid Crystal Technology

Introduction

Saya Yoneyama is a prominent inventor based in Shizuoka, Japan. She has made significant contributions to the field of liquid crystal technology, particularly through her innovative patent work. Her expertise and dedication to research have positioned her as a notable figure in the industry.

Latest Patents

Saya Yoneyama holds a patent for a "Polymer containing scattering type vertically aligned liquid crystal device." This invention relates to a polymer that features a scattering type vertically aligned liquid crystal device with very low hysteresis characteristics. The reduction of hysteresis is achieved by providing a pretilt angle, which enhances the performance of the device.

Career Highlights

Throughout her career, Saya has worked with reputable companies, including Rolic AG and Rolic Technologies AG. Her experience in these organizations has allowed her to refine her skills and contribute to advancements in liquid crystal technology.

Collaborations

Saya has collaborated with various professionals in her field, including her coworker Yuichiro Yamada. Their joint efforts have furthered the development of innovative solutions in liquid crystal applications.

Conclusion

Saya Yoneyama is a talented inventor whose work in liquid crystal technology has made a significant impact. Her patent and collaborations reflect her commitment to innovation and excellence in her field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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